Thanks 8tey,
I was thinking of a more unexpected use of tha 4DS technology.
A special memomry for the DoD, for example.
Until 2017, KH was president of Memoright International which had some contratcs with US Defense
But maybe there is no need to look at other uses.
Polecam could be right and they managed to use imec EUV to show that a 4DS cels array can be verticaly stacked
Wich will mean a low cost process.
The holy grail !
But still not sure that the etching problem was entirely solved.
imo, they met this problem when trying to punch holes through several electrode layers. There is always a residue problem when they do that.
I tend to think that they decided that this problem could solved later and that the technology - as it is - was good enough to be sold or to attract some new developpment partner.
All speculation, of course.
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