So for the tech layman (me) reading this suggests imec convinced 4DS to change something else when they changed the mask etch process? "something in the design that wasn't there" and "design flaw"
if that's the case, and they were wrong, I reckon imec owes us a freebie
could start with rebuild the platform lot only correcting the mask etch issue and nothing else... Just to give confidence back and then iterate on the smaller geometries
Feels like one too many variables were changed at once and now it's hard to say which specific issue was the cause of the latest failureis this what "reference cells perform similarly" means in the recent release - that what they gave imec to build from worked but through the imec process it was cooked?
Putting this together - 4DS still have good ingredients but imec couldn't bake the cake...?
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