my take pl5 was mask/etch optimsation on a ' scaled stack ' ie iterative process improvement required to gain a data set that would define the manufacturing framework for 20nm / pl6
it is far from a derisk imo as such a process is researching what will hopefully be a functional and manufacturable 20nm PL6
the benchmark outcomes (good or bad) from 20nm will determine if de risk is an appropriate term ( not imo though)
the infineon lens: there is no partnership with infineon at this point or that would have been announced - there is a fee for service design contract which is great - it is a further step to achieve a working pcmo reram exactly as IMEC have been doing for the past however many years
waiting for: 20nm pops out equal to or better than 30% of the required design targets and you have an outcome you can assess and work with - terms like derisk and success are not 'useful' in that assessment
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