i'l make it a bit simpler for people who are not techy, if it is a problem with the etch process, it's sort of like a fuse that needs replacing as a comparison to auto works, compared to an engine problem like the head that might need replacing.
It means the architecture of the technology in the wafer and it's arrays and voltage presence is not the fault. As the process has been checked now, and it's been demonstrated through Imecs testing that it's the etching procedure probably just needs some adjustment, but the stuff that does the work is so far performing well for 4th level platform wafers.
We are getting so close i hope.
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