CXO888 / any other attendees, page-16

@Denofiniquity1
yeah its interesting for a number of reasons
the 'electrodes' are .5mm and are deposited to the thin film via sputtering to a designated and calibrated thickness for 60nm fabrication ( at room temp)
this process will need adjustment down to 20nm - this alters the separation dynamic between the electrode and thin film altering the interface exchange and the ion drift between lrs and hrs - those voltage adjustments to control the switching interface will become more critical to the cells operational integrity

for this reason (one of many) the process and the materials for 60nm will reman the same at 20nm as Ting says but the outcome can be very different due to just one of the reasons above.
Edge and field integrity will also introduce an unknown entity to be managed at 20nm as it was successful at 60nm but untested at 20nm
like you I have no idea - I'm just putting out there what I know - others may find it useful or not