IQE Silex and BLG, page-3

I'm puzzled. Since the cREO technology was about providing a "virtual substrate" as a barrier substrate which acted as a buffer substrate (i.e cREO) between was about a buffer between silicon and other crystalline semiconductor materials (i.e GaN and/or other group 3/5 compound semi conductors) I really can't see the connection. I understand that some of the old Translucent (the cREO subsidiary of Silex) staff may have moved to BLG but would like to know a bit more about your suppositions. As I understood it IQE were planning to use cREO in 5G carrier filters but evidently dropped it (possibly only temporally) due to the amount of development to make it commercial.

Applications of cREO highlighted by Translucent in 2011 were:



and

Gallium Nitride on silicon (vGaN™)Virtual substrates for LED lighting and power electronics markets:
LED lighting ~$11B market today with strong growth (TAM* ~ $300m)
Power electronics FET devices ~$17B market today with strong growth (TAM ~ $500m)
Lowers cost (vs Sapphire wafers), improves performance
Silicon wafer key solution for transition to larger 150/200mm wafers
Rare Earth Oxide layer enables engineered low-bow wafer and excellent mirror layers required forLED device fabrication.

Completed upgrade of 150mm wafer reactor, now producing sample wafers forcustomers in USA and Asia. New 200mm reactor currently being built.